Shandong Zhongshan Photoelectric Materials Co., Ltd

All
  • All
  • Title
HomeProductsStable Isotope MaterialsNuclear Power Safety MaterialsBoron11 Semiconductor Dry Etching Semiconductor Dopant

Boron11 Semiconductor Dry Etching Semiconductor Dopant

  • $500
    ≥100
    Gram
Payment Type:
L/C,T/T,Paypal
Min. Order:
100 Gram
Share:
  • Product Description
Overview
Product Attributes

Model No.Boron11

Supply Ability & Additional Information

Payment TypeL/C,T/T,Paypal

Packaging & Delivery
Selling Units:
Gram

Boron11 Semiconductor Dopant Semiconductor Dry Etching

Product introduction

Triethyl boron 11 acid is also called ethyl borate and triethoxy boron. Its chemical formula is C6H15BO3, molecular weight is 145.99, melting point is -84.5°C, and boiling point is 117.5°C. Triethyl boron 11 acid is a colorless and transparent liquid with a slight odor and remarkable thermal stability. It is miscible with ethanol and ether, and decomposes in water. Triethyl boron 11 acid can be used as a doping source to be incorporated into the thin layer on the surface of the silicon wafer, and make it reach the specified amount and meet the required distribution form, in order to change the electrochemical properties of the semiconductor, and can produce PN junction, resistance, Interconnect wires, etc.

 Quality Specification

items

Units

Index

 Boron11 ≥

Vol.%

99.9995

Oxygen+Argon<

Vol.ppm

1

Nitrogen<

Vol.ppm

4

Ca

rbon monoxide<

Vol.ppm

0.5

Carbon dioxide<

Vol.ppm

0.2

Methane <

Vol.ppm

0.5


Total impurity content≤

Vol.ppm

5

Metal ion

Vol.ppm


Supply and demand agreement

Application

Triethyl boron 11 acid is also called ethyl borate and triethoxy boron. Its chemical formula is C6H15BO3, molecular weight is 145.99, melting point is -84.5°C, and boiling point is 117.5°C. Triethyl boron 11 acid is a colorless and transparent liquid with a slight odor and remarkable thermal stability. It is miscible with ethanol and ether, and decomposes in water. Triethyl boron 11 acid can be used as a doping source to be incorporated into the thin layer on the surface of the silicon wafer, and make it reach the specified amount and meet the required distribution form, in order to change the electrochemical properties of the semiconductor, and can produce PN junction, resistance, Interconnect wires, etc.



Product Categories : Stable Isotope Materials > Nuclear Power Safety Materials

Email to this supplier
  • *Subject:
  • *To:
    Mr. Edward Xu
  • *Email:
  • *Message:
    Your message must be between 20-8000 characters
HomeProductsStable Isotope MaterialsNuclear Power Safety MaterialsBoron11 Semiconductor Dry Etching Semiconductor Dopant
Send Inquiry
*
*

Home

Product

Phone

About Us

Inquiry

We will contact you immediately

Fill in more information so that we can get in touch with you faster

Privacy statement: Your privacy is very important to Us. Our company promises not to disclose your personal information to any external company with out your explicit permission.

Send