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Shandong Zhongshan Photoelectric Materials Co., Ltd
Model No.: Nitrogen trifluoride CAS: 7783-54-2
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Nitrogen Trifluoride CAS: 7783-54-2 NF3
99.5%Plasma Etching Gas
Product introduction
Nitrogen trifluoride (NF3) is a kind of colorless, odorless and character stable gas, it is also a kind of strong oxidant. At normal temperature and pressure, its melting point is 206.8 ℃, boiling point is 129.0 ℃, insoluble in water. Nitrogen trifluoride in the microelectronics industry is a kind of excellent plasma etching gas, which is cracked into active fluorine ion during the process of plasma etching. For the plasma etching of silicon and silicon nitride, using nitrogen trifluoride has higher etching rate and selectivity than using of carbon tetrafluoride or carbon tetrafluoride and oxygen mixed gas, especially in the process of etching integrated circuit material with the thickness of less than 1.5 μm, nitrogen trifluoride has excellent etching rate and selectivity, what's more, there is no pollution on the surface of etched material, it is also a good cleaning agent.
Quality specification
| Project | Unit | index | ||||
| （NF3）≥ | Vol.% | 99.5 | 99.9 | 99.98 | 99.99 | 99.996 |
| （CF4）≤ | Vol.ppm | 1500 | 500 | 100 | 50 | 20 |
| （N2）≤ | Vol.ppm | 700 | 50 | 10 | 10 | 5 |
| （O2+Ar））≤ | Vol.ppm | 700 | 50 | 10 | 5 | 3 |
| （CO）≤ | Vol.ppm | 50 | 10 | 10 | 5 | 1 |
| （CO2）≤ | Vol.ppm | 25 | 10 | 10 | 5 | 0.5 |
| （N2O）≤ | Vol.ppm | 50 | 10 | 10 | 5 | 1 |
| （SF6）≤ | Vol.ppm | 50 | 50 | 10 | 5 | 2 |
| Hydrolyzable fluoride （Measured by HF）≤ | Vol.ppm | 1 | 1 | 1 | 1 | 1 |
| （H2O）≤ | Vol.ppm | 1 | 1 | 1 | 1 | 1 |
Application
Nitrogen trifluoride can be used as fluorine source of high energy chemical laser gas and as etching agent for Semiconductor Materials such as polysilicon, silicon nitride and tungsten silicide. It can also be used as a cleaning agent for chemical vapor deposition chamber and LCD panel. Nitrogen trifluoride is used as a cleaning agent for CVD box, which can reduce pollutant emission by 90% compared with perfluorocarbons, and significantly improve the cleaning speed and cleaning capacity.
Packaging and storage
Nitrogen trifluoride is filled in a steel seamless cylinder with the volume of 8L, 40L, 43.3L and 47L, respectively. The model of cylinder is DOT-3AA, GB 5099, the pressure of cylinder is 9.0-13.0MPa. Packaging specifications can be customized according to customers' requirements.
Product Categories : Semiconductor Electronic Chemical Materials > Fluorine-containing High-purity Electronic Special Gas
Privacy statement: Your privacy is very important to Us. Our company promises not to disclose your personal information to any external company with out your explicit permission.
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Privacy statement: Your privacy is very important to Us. Our company promises not to disclose your personal information to any external company with out your explicit permission.