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Model No.: Tantalum(V) Fluoride CAS: 7783-71-3
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Tantalum(V) Fluoride CAS: 7783-71-3 TaF5 99.9% 3N Chemical Crystal Material Semiconductor Process materials
Product introduction
Tantalum(V) Fluoride (TaF5) is a white crystal with strong refractive ability at room temperature, its relative molecular mass is 276, melting point is 96.8℃, boiling point is 229.5℃. Tantalum(V) Fluoride is slightly soluble in hot solution of carbon disulfide and carbon tetrachloride, it is soluble in water and ether, hydrofluoric acid, nitric acidandfuming nitric acid, it is hygroscopic in air without hydrolysis. High pure Tantalum(V) Fluoride isused in the microelectronics industry for chemical vapor deposition of tantalum silicide or tantalum film, in order to produce interconnects and grid electrode with low resistance and high melting point.Tantalum(V) Fluoride can form insulation film with strong adhesion, thickness of 0.1 μm, and a high dielectric constant on the surface of the electronic components, semiconductor devices, titanium, metallic nitride electrode and metal tungsten.
Quality Specification
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Application
Tantalum(V) Fluoride is used in the microelectronics industry for chemical vapor deposition of tantalum silicide or tantalum film, in order to produce interconnects and grid electrode with low resistance and high melting point.
Packaging、Storage
Tantalum(V) Fluoride is stored in steel cylinders with packing specifications of 4.64L/10.2L/44L, the specific packaging specifications can be customized according to user requirements. Tantalum(V) Fluoride is stored in a shady and dry storeroom.
Product Categories : Semiconductor Electronic Chemical Materials > Semiconductor Electronic Chemical Materials
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Privacy statement: Your privacy is very important to Us. Our company promises not to disclose your personal information to any external company with out your explicit permission.