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Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 12 Products for Taf5 3n High Purity Material)
Tantalum Fluoride TaF5 Chemical Crystal Material
Tantalum(V) Fluoride CAS: 7783-71-3 TaF5 99.9% 3N Chemical Crystal Material Semiconductor Process materials Product introduction Tantalum(V) Fluoride (TaF5) is a white crystal with strong refractive
ability at room temperature, its relative molecular mass is 276, melting point
is 96.8℃, boiling point is 229.5℃....
Sodium Trifluoromethanesulfinate CF3NaO2S Pharmaceutical
Sodium Trifluoromethanesulfinate CAS: 2926-29-6 CF3NaO2S Pharmaceutical intermediates Product introduction Trifluoromethyl can improve the chemical and metabolic stability of the drug, improve its lipophilicity and bioavailability, and enhance the binding selectivity of the drug. It has a wide range of applications....
Xenon Difluoride XeF2 For Semiconductor Etching
C3F8 Octafluoropropane High Purity Wafer Etching Materials
Iodotrifluoromethane 99.99% 4N CF3I High Purity
IodotrifluoromethaneCAS2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching process materials Product Usage Iodotrifluoromethane can be used as semiconductor etching gas, electrical equipment insulation and arc extinguishing gas, fire extinguishing agent, refrigerant, etc. In addition, trifluoromethyl...
Perfluoropropane Semiconductor Etchant C3F8 High Purity 5N
Perfluoropropane CAS: 76-19-7 Semiconductor Etchant C3F8 High Purity 99.999% 5N Chip Etching Materials Product introduction Perfluoropropane (C3F8) is a kind of colorless, odorless, non-flammable inert gas. At normal temperature and pressure, its melting point is 183.0 ℃, boiling point is 36.7 ℃, poorly soluble in...
NF3 Nitrogen Trifluoride High Purity
NF3 Nitrogen Trifluoride CAS: 7783-54-2 99.5% High Purity for Electronic etching Special Gas Product
Usage Nitrogen Trifluoride (NF3) is a kind of colorless, odorless and character stable gas, it is also a kind of strong oxidant. Its melting point is 206.8 ℃, boiling point is 129.0 ℃, insoluble in water. Nitrogen...
Carbonyl fluoride CF2O For Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 CF2O Hight Purity For Etching Chemicals Agent Product introduction Molecular weight of carbonyl fluoride(CF2O) is 66.01 and its melting point is -114 ℃, boiling point is -84 ℃. Carbonyl fluoride is a kind of highly toxic and irritating gas with highly corrosive which has a strong...
5N Sulphur Hexafluoride SF6 Electronic Special Gas
Sulphur Hexafluoride CAS: 2551-62-4 SF6 99.999% 5N High-Purity Electronic Special Gas Product
Usage Sulphur Hexafluoride is a colorless, odorless, non-toxic, non-flammable inert gas with a molecular weight of 146.07, a melting point of -51°C, and a boiling point of -64°C. The molecular structure of sulfur hexafluoride...
Sulfur Hexafluoride SF6 High-Purity Electronic Special Gas
Sulfur Hexafluoride CAS: 2551-62-4 SF6 99.999% 5N High-Purity Electronic Special Gas Product
Usage Sulfur hexafluoride is a colorless, odorless, non-toxic, non-flammable inert gas with a molecular weight of 146.07, a melting point of -51°C, and a boiling point of -64°C. The molecular structure of sulfur hexafluoride...
High Purity Hydrogen H2 High-purity Electronic Special Gas
High Purity Hydrogen CAS:135-77-3 H2 99.999% 5N High-purity Electronic Special Gas Product
Usage High-purity hydrogen (H2) is a colorless and odorless combustible gas. The flammability limit in the air is 4.1%-74.1% (volume concentration). At room temperature, hydrogen is very stable in nature, and it is not easy to...
Silicon Tetrafluoride SiF4 Chemical Specialty Gases
High purity Silicon Tetrafluoride CAS: 7783-61-1 SiF4 99.999% 5N Chemical Electronic Specialty Gases Product introduction Silicon tetrafluoride (SiF4) is a kind of colorless, toxic, pungent and smelly gas with a molecular weight of 104.06. Silicon tetrafluoride is easily deliquescent and can produce thick smoke in...
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