Shandong Zhongshan Photoelectric Materials Co., Ltd

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HomeProductsSemiconductor Electronic Chemical MaterialsSemiconductor/Wafer Etching MaterialsNF3 Nitrogen Trifluoride High Purity

NF3 Nitrogen Trifluoride High Purity

  • $500
    ≥100
    Gram
Payment Type:
L/C,T/T,Paypal
Min. Order:
100 Gram
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  • Product Description
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Product Attributes

Model No.Nitrogen Trifluoride CAS: 7783-54-2

Supply Ability & Additional Information

Payment TypeL/C,T/T,Paypal

Packaging & Delivery
Selling Units:
Gram

NF3 Nitrogen Trifluoride CAS: 7783-54-2 99.5% 

High Purity for Electronic

 etching  Special Gas


Product Usage


Nitrogen Trifluoride (NF3) is a kind of colorless, odorless and character stable gas, it is also a kind of strong oxidant. Its melting point is 206.8 ℃, boiling point is 129.0 ℃, insoluble in water. Nitrogen trifluoride in the microelectronics industry is a kind of excellent plasma etching gas, which is cracked into active fluorine ion during the process of plasma etching. For the plasma etching of silicon and silicon nitride, using nitrogen trifluoride has higher etching rate and selectivity than using of Carbon Teltrafluoride or carbon tetrafluoride and oxygen mixed gas, especially in the process of etching integrated circuit material with the thickness of less than 1.5 μm, nitrogen trifluoride has excellent etching rate and selectivity, what's more, there is no pollution on the surface of etched material, it is also a good cleaning agent.

Product parameter


Items Unit Indexs
(NF3)≥ Vol.% 99.5 99.9 99.98 99.99 99.996
(CF4)≤ Vol.ppm 1500 500 100 50 20
(N2)≤ Vol.ppm 700 50 10 10 5
(O2+Ar))≤ Vol.ppm 700 50 10 5 3
(CO)≤ Vol.ppm 50 10 10 5 1
(CO2)≤ Vol.ppm 25 10 10 5 0.5
(N2O)≤ Vol.ppm 50 10 10 5 1
(SF6)≤ Vol.ppm 50 50 10 5 2
Hydrolyzable fluoride
(Measured by HF)≤
Vol.ppm 1 1 1 1 1
(H2O)≤ Vol.ppm 1 1 1 1 1

Product Categories : Semiconductor Electronic Chemical Materials > Semiconductor/Wafer Etching Materials

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