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Model No.: Nitrogen Trifluoride CAS: 7783-54-2
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NF3 Nitrogen Trifluoride CAS: 7783-54-2 99.5%
High Purity for Electronic
etching Special Gas
Product Usage
Nitrogen Trifluoride (NF3) is a kind of colorless, odorless and character stable gas, it is also a kind of strong oxidant. Its melting point is 206.8 ℃, boiling point is 129.0 ℃, insoluble in water. Nitrogen trifluoride in the microelectronics industry is a kind of excellent plasma etching gas, which is cracked into active fluorine ion during the process of plasma etching. For the plasma etching of silicon and silicon nitride, using nitrogen trifluoride has higher etching rate and selectivity than using of Carbon Teltrafluoride or carbon tetrafluoride and oxygen mixed gas, especially in the process of etching integrated circuit material with the thickness of less than 1.5 μm, nitrogen trifluoride has excellent etching rate and selectivity, what's more, there is no pollution on the surface of etched material, it is also a good cleaning agent.
Product parameter
Items | Unit | Indexs | ||||
(NF3)≥ | Vol.% | 99.5 | 99.9 | 99.98 | 99.99 | 99.996 |
(CF4)≤ | Vol.ppm | 1500 | 500 | 100 | 50 | 20 |
(N2)≤ | Vol.ppm | 700 | 50 | 10 | 10 | 5 |
(O2+Ar))≤ | Vol.ppm | 700 | 50 | 10 | 5 | 3 |
(CO)≤ | Vol.ppm | 50 | 10 | 10 | 5 | 1 |
(CO2)≤ | Vol.ppm | 25 | 10 | 10 | 5 | 0.5 |
(N2O)≤ | Vol.ppm | 50 | 10 | 10 | 5 | 1 |
(SF6)≤ | Vol.ppm | 50 | 50 | 10 | 5 | 2 |
Hydrolyzable fluoride (Measured by HF)≤ | Vol.ppm | 1 | 1 | 1 | 1 | 1 |
(H2O)≤ | Vol.ppm | 1 | 1 | 1 | 1 | 1 |
Product Categories : Semiconductor Electronic Chemical Materials > Semiconductor/Wafer Etching Materials
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Privacy statement: Your privacy is very important to Us. Our company promises not to disclose your personal information to any external company with out your explicit permission.