Shandong Zhongshan Photoelectric Materials Co., Ltd

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HomeProductsSemiconductor Electronic Chemical MaterialsSemiconductor/Wafer Etching MaterialsIodotrifluoromethane 99.99% 4N CF3I High Purity

Iodotrifluoromethane 99.99% 4N CF3I High Purity

  • $500
    ≥100
    Gram
Payment Type:
L/C,T/T,Paypal
Min. Order:
100 Gram
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  • Product Description
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Product Attributes

Model No.Iodotrifluoromethane CAS:7783-58-6

Supply Ability & Additional Information

Payment TypeL/C,T/T,Paypal

Packaging & Delivery
Selling Units:
Gram

IodotrifluoromethaneCAS2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching process materials

Product Usage

Iodotrifluoromethane can be used as semiconductor etching gas, electrical equipment insulation and arc extinguishing gas, fire extinguishing agent, refrigerant, etc. In addition, trifluoromethyl iodide can also interact with organometallic reagents. It is an important fluorine-containing intermediate for the introduction of fluoromethyl in organic synthesis. It can be widely used in organic synthesis, biochemistry, pesticides, medicine, surfactants and dyes, etc. field.

Product parameter

No.

Ingredients

Index

1

Trifluoromethyl iodide (CF3I),%(V/V) ≥

99

99.9

99.99

2

Oxygen+argon (O2+Ar), ppmv ≤  

300

50

10

3

Nitrogen (N2), ppmv ≤ 

1200

200

15

4

Carbon monoxide (CO), ppmv ≤

1000

100

15

5

Carbon dioxide (CO2), ppmv ≤ 

1000

100

5

6

Trifluoromethane (CF3H), ppmv ≤

3200

350

25

7

Trifluorobromomethane (CF3Br), ppmv ≤

3200

200

20

8

Water (H2O), ppmv ≤

100

50

10



Product Categories : Semiconductor Electronic Chemical Materials > Semiconductor/Wafer Etching Materials

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