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Model No.: Iodotrifluoromethane CAS:7783-58-6
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IodotrifluoromethaneCAS2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching process materials
Product Usage
Iodotrifluoromethane can be used as semiconductor etching gas, electrical equipment insulation and arc extinguishing gas, fire extinguishing agent, refrigerant, etc. In addition, trifluoromethyl iodide can also interact with organometallic reagents. It is an important fluorine-containing intermediate for the introduction of fluoromethyl in organic synthesis. It can be widely used in organic synthesis, biochemistry, pesticides, medicine, surfactants and dyes, etc. field.
Product parameter
No. | Ingredients | Index | ||
1 | Trifluoromethyl iodide (CF3I),%(V/V) ≥ | 99 | 99.9 | 99.99 |
2 | Oxygen+argon (O2+Ar), ppmv ≤ ≤ | 300 | 50 | 10 |
3 | Nitrogen (N2), ppmv ≤ ≤ | 1200 | 200 | 15 |
4 | Carbon monoxide (CO), ppmv ≤≤ | 1000 | 100 | 15 |
5 | Carbon dioxide (CO2), ppmv ≤ ≤ | 1000 | 100 | 5 |
6 | Trifluoromethane (CF3H), ppmv ≤ | 3200 | 350 | 25 |
7 | Trifluorobromomethane (CF3Br), ppmv ≤ | 3200 | 200 | 20 |
8 | Water (H2O), ppmv ≤ | 100 | 50 | 10 |
Product Categories : Semiconductor Electronic Chemical Materials > Semiconductor/Wafer Etching Materials
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