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Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 12 Products for Lipf6 Chemical Material)
Lithium Hexafluorophosphate LiPF6 Electrolyte Additives
Lithium Hexafluorophosphate LiPF6 CAS: 21324-40-3 Electrolyte Additives Battery material Product introduction Lithium hexafluorophosphate (LiPF6) is a white crystal or powder, soluble in water, soluble in low concentration of methanol, ethanol, carbonate and other organic solvents, melting point is 200 ℃, the relative...
Fluorinated Graphene Anti-corrosion Energy Nattery Materials
Fluorinated Fullerene C60F48 CAS：51311-17-2Chemical Powdered Solid Battery Cathode Material Product introduction The fluorinated fullerene uses fullerene (C60) as a raw material and is formed by directly reacting with fluorine gas at a certain temperature. The molecular formula is C60F48. It is currently the most...
Fluorinated Graphene Solid Lubricating Material
Fluorinated Fullerene C60F48 CAS：51311-17-2Chemical Powdered Solid Battery Cathode Material Product introduction Fluorofossil merene is an important new graphene derivative. Compared with graphene, although the hybrid mode of carbon atoms changes from sp2 to sp3, it also retains the lamellae structure of graphene....
Xenon Difluoride XeF2 For Semiconductor Etching
C3F8 Octafluoropropane High Purity Wafer Etching Materials
Iodotrifluoromethane 99.99% 4N CF3I High Purity
IodotrifluoromethaneCAS2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching process materials Product Usage Iodotrifluoromethane can be used as semiconductor etching gas, electrical equipment insulation and arc extinguishing gas, fire extinguishing agent, refrigerant, etc. In addition, trifluoromethyl...
Perfluoropropane Semiconductor Etchant C3F8 High Purity 5N
Perfluoropropane CAS: 76-19-7 Semiconductor Etchant C3F8 High Purity 99.999% 5N Chip Etching Materials Product introduction Perfluoropropane (C3F8) is a kind of colorless, odorless, non-flammable inert gas. At normal temperature and pressure, its melting point is 183.0 ℃, boiling point is 36.7 ℃, poorly soluble in...
C4F6 Hexafluoro-1 3-Butadiene 4N chip Etching agent
C4F6 CAS:685-63-2 Hexafluoro-1 3-Butadiene 99.99% 4N chip Etching agent Product Usage Hexafluoro-1,3-Butadiene(C4F6) is a kind of colorless, odorless, and water insoluble gas. At normal temperature and pressure, its melting point is 132.0 ℃, boiling point is 5.9 ℃.Hexafluoro-1,3-Butadiene is a kind of conjugated...
Carbonyl fluoride CF2O For Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 CF2O Hight Purity For Etching Chemicals Agent Product introduction Molecular weight of carbonyl fluoride(CF2O) is 66.01 and its melting point is -114 ℃, boiling point is -84 ℃. Carbonyl fluoride is a kind of highly toxic and irritating gas with highly corrosive which has a strong...
Titanium Tetrafluoride TiF4 Microelectronics industry
Titanium Tetrafluoride CAS: 7783-63-3 TiF4 Purity 98.5% For Microelectronics industry application Product introduction Titanium tetrafluoride is also called titanium fluoride, its molecular
formula is TiF4, molecular weight is 123.86, melting point is 284 ℃. Titanium tetrafluoride is a hygroscopic
white powder at room...
Tantalum Fluoride TaF5 Chemical Crystal Material
Tantalum(V) Fluoride CAS: 7783-71-3 TaF5 99.9% 3N Chemical Crystal Material Semiconductor Process materials Product introduction Tantalum(V) Fluoride (TaF5) is a white crystal with strong refractive
ability at room temperature, its relative molecular mass is 276, melting point
is 96.8℃, boiling point is 229.5℃....
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